![]() Furthermore, the scalability would allow industrial application, as opposed to, e.g., micromechanical cleavage. Because of their chemical approach, these techniques are well suited to synthesizing 2D materials (2DMs) with a low defect concentration. One of the advantageous aspects of chemical deposition methods, such as CVD and ALD, is the growth of thin films onto a variety of substrates as well as 3D structures. Subsequently, a chemical reaction occurs, resulting in the deposition of a film of a solid material on the substrate. ![]() Besides, these techniques include the transport of one or more precursor chemicals in the gas phase onto a substrate. ![]() Chemical vapor deposition (CVD) and atomic layer deposition (ALD), which is in some regards an enhanced version of CVD, are techniques that can provide exceptionally conformal large-area coatings, even for complex surface geometries. Ultrathin 2D transition metal dichalcogenide (TMD) thin films have attracted much attention due to their very good electrical, optical, and electrochemical properties. ![]()
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